In this process, the substrate is placed inside a reactor to which a number of gases are supplied. The fundamental principle of the process is that a chemical reaction takes place between the source gases. The product of t… See more

This process is also known as "electroplating" and is typically restricted to electrically conductive materials. There are basically two technologies for plating: Electroplating and Electroless plating. In the electro… See more

This technology is quite similar to what happens in CVD processes, however, if the substrate is an ordered semiconductor crystal (i.e. silicon, gallium arsenide), it is possible with this process to continue building on … See more

This is one of the most basic deposition technologies. It is simply oxidation of the substrate surface in an oxygen rich atmosphere. The temperature is raised to 800° C-1100° C to speed up the process. This is als… See more